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  • Project Associate-I Post in NIT Silchar via Direct Recruitment

    Event Status : Created Event

Timeline

Important Dates

Application Closing Date
16/04/2024
Application Opening Date
02/04/2024

Other Important Information

Appointment Type
Direct Recruitment
Application Submission Method
Online
Age Limit
18-35
Qualification Required
Postgraduate, Graduate
Total Vacancies
1
Advertisement Number
NITS/Dean(R&C)/EIE/668/01/2024
Location of Posting/Admission
Cachar District, Assam, India, 788101
Exam
GATE
Age Relaxation Type
SC/ST, Other Backward Class, Person with Benchmark Disabilities, Woman
Work Experience
Yes
Place of Posting/Admission
Silchar, Assam, India
Organisation Type
Educational Institution
Website
http://www.nits.ac.in/
Post Type
Contractual
Interview
Yes
Salary
31000

Note: This information is common for all posts. For details on specific posts, refer to the official notification.

Posts Released

1. Project Associate-I

Important Updates

Refer to the official notification for more details.

Application Summary

National Institute of Technology Silchar has released a notification for the Project Associate-I post. Interested candidates can apply from 02/04/2024 to 16/04/2024. Download the official notification for details on eligibility, post information, job procedure, pay scale, and more.

National Institute of Technology Silchar invites applications for the following posts via direct recruitment:

Post Name:Project Associate-I

Essential Qualification: B.E/B.Tech. or M.E./M.Tech.in ECE/EE/EIE/relevant area with GATE qualification. (Non-GATE candidates are also encouraged to apply. The fellowship will vary for non-GATE candidates as per SERB guidelines)

Desirable: Knowledge in the field of Semiconductor Devices, Nano/microelectronics, Thin Film Deposition, Device Fabrication, Electrical Characterization and TCAD simulation

 

Application send via email to skpandey@ei.nits.ac.in

For more details related to eligibility criteria, fee, pattern, annexure, place of posting etc. refer to the attachments below.